硅片硅料清洗机技术的特点是不分处理对象的基材类型，均可进行处理，可实现整体和局部以及复杂结构的清洗。因此，硅片硅料清洗机被日益广泛应用于各行各业：

The characteristic of silicon wafer cleaning machine technology is that it can be processed regardless of the substrate type of the processing object, and it can realize the cleaning of the whole, part and complex structure. Therefore, silicon wafer cleaning machines are increasingly widely used in all walks of life:

1、机械行业：防锈油脂的去除；量具的清洗；机械零部件的除油除锈；发动机、化油器及汽车零件的清洗；过滤器、滤网的疏通清洗等。

1. Machinery industry: removal of antirust grease; Cleaning of measuring tools; Degreasing and derusting of mechanical parts; Cleaning of engine, carburetor and auto parts; Dredging and cleaning of filters and strainers, etc.

2、表面处理行业：电镀前的除油除锈；离子镀前清洗；磷化处理；积炭；氧化皮；抛光膏；金属工件表面活化处理等。

2. Surface treatment industry: degreasing and derusting before electroplating; Cleaning before ion plating; Phosphating treatment; Remove carbon deposits; Remove oxide scale; Remove polishing paste; Metal workpiece surface activation treatment, etc.

3、仪器仪表行业：精密零件的高清洁度装配前的清洗等。

3. Instrument industry: high definition cleanliness of precision parts, cleaning before assembly, etc.

4、电子行业：印刷线路板除松香、焊斑；高压触点等机械电子零件的清洗等。

4. Electronics industry: except rosin and solder spots on printed circuit boards; Cleaning of mechanical and electronic parts such as high-voltage contacts, etc.

5、医疗行业：医疗器械的清洗、、、实验器皿的清洗等。

5. Medical industry: cleaning, disinfection, sterilization of medical devices, cleaning of experimental vessels, etc.

6、半导体行业：半导体晶片的高清洁度清洗。

6. Semiconductor industry: high definition cleanliness cleaning of semiconductor chips.

7、钟表首、饰行业：油泥、灰尘、氧化层、抛光膏等。

7. Watch head and decoration industry: remove oil sludge, dust, oxide layer, polishing paste, etc.

8、化学、生物行业：实验器皿的清洗、除垢。

8. Chemical and biological industries: cleaning and descaling of experimental vessels.

9、光学行业：光学器件的除油、除汗、清灰等。

9. Optical industry: oil, sweat and ash removal of optical devices.

10、纺织印染行业：清洗纺织锭子、喷丝板等。

10. Textile printing and dyeing industry: cleaning textile spindles, spinnerets, etc.

11、石油化工行业：金属滤网的清洗疏通、化工容器、交换器的清洗等。

11. Petrochemical Industry: cleaning and dredging of metal filter screen, cleaning of chemical containers and exchangers, etc.

硅片硅料清洗机的机理，主要是依靠等离子体中活性粒子的“活化作用”达到去除物体表面污渍的目的。就反应机理来看，等离子体清洗通常包括以下过程：无机气体被激发为等离子态；气相物质被吸附在固体表面；被吸附基团与固体表面分子反应生成产物分子；产物分子解析形成气相；反应残余物脱离表面。

The mechanism of silicon wafer cleaning machine mainly relies on the "activation" of active particles in plasma to remove stains on the surface of objects. In terms of reaction mechanism, plasma cleaning usually includes the following processes: inorganic gas is excited into plasma state; Gaseous substances are adsorbed on the solid surface; The adsorbed group reacts with the solid surface molecules to produce product molecules; The product molecules are resolved to form gas phase; The reaction residue is separated from the surface.

超声波清洗机生产厂家提醒，硅片硅料清洗机有三种方法：

The manufacturer of ultrasonic cleaning machine reminds that there are three methods for silicon wafer and silicon material cleaning machine:

①刷洗或擦洗：可除去颗粒污染和大多数粘在片子上的薄膜。

① Brushing or scrubbing: it can remove particle pollution and most of the films stuck on the film.

②高压清洗：是用液体喷射片子表面，喷嘴的压力高达几百个大气压。高压清洗靠喷射作用，片子不易产生划痕和损伤。但高压喷射会产生静电作用，靠调节喷嘴到片子的距离、角度或加入防静电剂加以避免。

② High pressure cleaning: liquid is used to spray the surface of the sheet, and the pressure of the nozzle is as high as hundreds of atmospheres. High pressure cleaning relies on spray, so the film is not easy to produce scratches and damage. However, high-pressure spray will produce electrostatic effect, which can be avoided by adjusting the distance and angle between the nozzle and the film or adding antistatic agent.

③超声波清洗：超声波声能传入溶液，靠气蚀作用洗掉片子上的污染。但是，从有图形的片子上除去小于1微米颗粒则比较困难。将频率提高到超高频频段，清洗效果更好。

③ Ultrasonic cleaning: ultrasonic energy is transferred into the solution, and the pollution on the film is washed away by cavitation. However, it is difficult to remove particles smaller than 1 micron from the patterned film. The cleaning effect is better when the frequency is increased to ultra-high frequency band.

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